|
Chris Bailey
Vice President Systems Engineering
Edwards |
學歷
經歷
- 1982 HND Mechanical Engineering
經歷
- 1999 – now: development of vacuum, abatement and related equipment for semiconductor processes.
- 1990 – 1999: Vacuum Pump development for semiconductor applications, Edwards
- 1987 – 1990: Optical Systems development, KeyMed
- 1985-1987: Diesel Fuel Injection development, Lucas CAV
- 1982 – 1985: Aircraft Instrumentation development, Negretti Aviation
講題: 氫氣的回收與循環再利用
摘要:
EUV Lithography is being prepared for HVM and depends on a continuous high flow of pure hydrogen.
The hydrogen consumption for a single EUV Lithography is 20 times higher than for a typical Epi chamber. A leading edge fab can expect to install a large number of EUV Lithography tools and hence will see a significant increase in the hydrogen requirement.
Whilst hydrogen is abundant, being sourced from water or methane, such high-volume consumption leads to concerns about energy, carbon footprint, security of supply and safety.
A system that recovers and purifies hydrogen and returns it to the EUV Lithography tool has been developed as an integral part of the sub-fab vacuum and exhaust gas management system that supports the tool.
The first hydrogen recovery systems are scheduled to be integrated into vacuum and exhaust gas management systems in Q4 2019 and Q1 2020.
In this presentation we will show how recovery of hydrogen reduces the carbon footprint of EUV Lithography and explain how purity and availability are assured so that the productivity from the EUV Lithography tools is unaffected.
摘要:
EUV Lithography is being prepared for HVM and depends on a continuous high flow of pure hydrogen.
The hydrogen consumption for a single EUV Lithography is 20 times higher than for a typical Epi chamber. A leading edge fab can expect to install a large number of EUV Lithography tools and hence will see a significant increase in the hydrogen requirement.
Whilst hydrogen is abundant, being sourced from water or methane, such high-volume consumption leads to concerns about energy, carbon footprint, security of supply and safety.
A system that recovers and purifies hydrogen and returns it to the EUV Lithography tool has been developed as an integral part of the sub-fab vacuum and exhaust gas management system that supports the tool.
The first hydrogen recovery systems are scheduled to be integrated into vacuum and exhaust gas management systems in Q4 2019 and Q1 2020.
In this presentation we will show how recovery of hydrogen reduces the carbon footprint of EUV Lithography and explain how purity and availability are assured so that the productivity from the EUV Lithography tools is unaffected.